采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
用离子蚀刻加扫描电镜观察和微区成分分析的方法研究了耐磨白口铁中球形碳化物的结构。
The structure of spheroidal carbide in wear resistant white iron was investigated by SEM observation and EPMA of ion etched metallographic specimen.
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