采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
用离子蚀刻加扫描电镜观察和微区成分分析的方法研究了耐磨白口铁中球形碳化物的结构。
The structure of spheroidal carbide in wear resistant white iron was investigated by SEM observation and EPMA of ion etched metallographic specimen.
三氯化铁溶液不断地冲刷不锈钢板的表面，溶液中的三价铁离子快速氧化不锈钢板，不锈钢板就被蚀刻下去了。
Ferric chloride solution constantly scouring the surface of stainless steel plate, the solution of ferric ion rapidly oxidized stainless steel plate, stainless steel plate was etched on the go.
由于等离子体是一种具有很高能量和极高活性的物质，它对于任何有机材料等都具有良好的蚀刻作用，因而在最近几年也被引用到印制电路板制造中来。
The plasma is a high energy and high activity material, it has good etching effect for any organic material, which in recent years has also been referenced to the printed circuit board manufacturing.
研究结果表明，电解法能够有效地去除碱氨蚀刻废水中的铜离子，并可以回收金属铜。
The result of study indicated that the electrolytic method can remove copper ions of the alkali ammonia etching wastewater effectively , and reclaim metal copper.
研究结果表明，电解法能够有效地去除碱氨蚀刻废水中的铜离子，并可以回收金属铜。
The result of study indicated that the electrolytic method can remove copper ions of the alkali ammonia etching wastewater effectively, and reclaim metal copper.
最后，采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵，以制成纳米多孔金属材料。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
记录材料为入射离子在其中能产生可蚀刻潜径迹的表面平整光洁的绝缘材料。
The record material is insulator material with smooth surface, which can produce etched latent trace when irradiated by incident ions.
由于它的优点，如高蚀刻率、高选择性、无碳蚀刻和最小限度的残留污染，电子工业把它用在等离子和热清洁应用中。
The electronics industry uses it in plasma and thermal cleaning applications for its advantages such as high etch rates, high selectivity, carbon-free etching, and minimal residual contamination.
然而，对一个宽槽来说，由于等离子区内边界层的变形，其蚀刻宽度会随着蚀刻深度的增加而增加。
However, for a wide trench, the width of etched profile will increase with the increase of its depth since the deformation of boundary layer in plasma.
本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
介绍了聚合物锂离子电池正、负极集流体表面的蚀刻与预处理及热压与直接涂布两种电极制备工艺。
The surface etching and pretreatment of the current of positive and negative electrodes of polymer Li-ion batteries was introduced.
高能重离子在绝缘材料表面产生的潜径迹经过蚀刻后形成一定形貌的核径迹孔，而密集的径迹孔表面相当于渐变折射率层。
High energy heavy ions generate potential tracks on the face of insulated material, and a porous surface with gradient refractive index can be formed by etching the ion tracks.
对离子束蚀刻深度传感器敏感元件与传感元件间的耦合问题进行了探讨。
The coupling problem between sensitive element and sensing element in etching depth sensor is discussed.
这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。
The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.
这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。
The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.
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