湿法刻蚀是一种刻蚀方法，是将刻蚀材料浸泡在腐蚀液内进行腐蚀的技术。
Etching time has been extended in wet etching course .
在湿法刻蚀诱导坑时，需适当延长刻蚀时间。
参考来源 - 硅微通道列阵电化学微加工技术研究One of the transparent conductive thin films indium tin oxides (ITO) was selected as electrode of PLZT and BST. ITO thin films based on quartz were prepared by sputtering, and chemical wet-etching was used to micro-pattern of ITO.
本文选择ITO透明导电薄膜作为铁电薄膜PLZT和BST的电极，用溅射法在石英玻璃上制备了ITO薄膜，用化学湿法刻蚀对ITO薄膜微图形化，并初步探索了PLZT薄膜和BST薄膜的电光性能。
参考来源 - 电光移相器阵列用铁电薄膜研究·2,447,543篇论文数据，部分数据来源于NoteExpress
在湿法刻蚀诱导坑时，需适当延长刻蚀时间。
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
最后利用三维表面形貌仪，分别对湿法刻蚀和干法刻蚀的磁头结构进行了数据分析。
The etching parameters and the photos of the head slider were presented. 3D surface microstructures of the head sliders were analyzed by Vecco MHT-III interferometer.
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