在湿法刻蚀诱导坑时，需适当延长刻蚀时间。
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
最后利用三维表面形貌仪，分别对湿法刻蚀和干法刻蚀的磁头结构进行了数据分析。
The etching parameters and the photos of the head slider were presented. 3D surface microstructures of the head sliders were analyzed by Vecco MHT-III interferometer.
并且采用湿法刻蚀技术，制备了该结构的LED芯片，测试得到该种LED芯片出光效率较之普通LED芯片提高了33%。
Then the LED of this kind of structure is gotten by means of wet etching, and its efficiency increases by 33% compared with normal LED.
用浸没的湿法刻蚀方法，以熔石英为基板刻蚀材料，用优化配方的HF刻蚀液进行刻蚀，研究了HF刻蚀一维光栅台阶的斜坡陡度。
By immersing wet_etch method, slope angle of one_dimension step gratings is studied with fused silica and optimized etching liquor HF.
用浸没的湿法刻蚀方法，以熔石英为基板刻蚀材料，用优化配方的HF刻蚀液进行刻蚀，研究了HF刻蚀一维光栅台阶的斜坡陡度。
By immersing wet_etch method, slope angle of one_dimension step gratings is studied with fused silica and optimized etching liquor HF.
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