随着人们对低压CVD合成金刚石薄膜技术的深入研究，金刚石薄膜的质量有了很大的提高。

With the deeply investigation of synthesizing technique by low pressure CVD, the quality of diamond film is improved greatly.

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和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。

The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.

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