A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.

提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。

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At the same time, the influence of plasma charging and ion bombardment on the quality of silicon oxide are analyzed.

我们同时对反应离子刻蚀工艺中的等离子体充电效应和离子轰击对氧化硅造成的损伤进行了讨论。

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A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).

采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。

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For instance, the ultra-thin layers of graphene (a two-dimensional form of graphite) are formed by injecting liquid solutions containing carbon and silicon into an extremely hot, ionised gas (plasma) of argon.

ECONOMIST: MONITOR

But the maker of the plasma lights says they cost less than LEDs because they require less silicon to produce.

FORBES: Beyond LEDs: Indiana Town Goes For Light Emitting Plasma To Save Money