plasma-deposited silicon nitride
plasma-deposited silicon nitride
等离子体沉积氮化硅
以上为机器翻译结果，长、整句建议使用 人工翻译 。
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Hard and wear-resistant titanium nitride coatings were deposited by pulsed high energy density plasma technique on silicon nitride ceramic cutting tools at ambient temperature.
用高能量密度脉冲等离子体于室温下在氮化硅陶瓷刀具上成功沉积了高硬耐磨的氮化钛涂层。
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