To discuss plasma cathode guns at last.
最后讨论一下等离子体阴极电子枪。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
The main purpose of this paper is to introduce the structure and functions of plasma powder surfacing gun with cathode powder feeding.
本文主要对一种具有新的送粉方式——阴极内送粉的等离子堆焊枪的结构和性能进行了一定的探讨。
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