To discuss plasma cathode guns at last.
最后讨论一下等离子体阴极电子枪。
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
The main purpose of this paper is to introduce the structure and functions of plasma powder surfacing gun with cathode powder feeding.
本文主要对一种具有新的送粉方式——阴极内送粉的等离子堆焊枪的结构和性能进行了一定的探讨。
The main construction and key technique of long pulse length hollow cathode plasma electron gun are presented.
给出长脉冲空心阴极等离子体电子枪结构与关键技术。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
The properties of the cathode fall region are discussed by applying one dimensional model of non equilibrium plasma region adjacent to an electric arc cathode.
采用一维非平衡等离子体模型讨论了阴极区的等离子体性质，阴极区被分为电离区和空间电荷区。
With this apparatus, a plasma jet consisting of a mixture of methane, hydrogen and argon is realized at a high density between the anode and cathode.
这种装置是在阴极和阳极间用甲烷氢气及氩气产生高密度等离子体射流。
The article researched heating mechanics of hollow cathode discharge effect and the process of hollow cathode plasma sintering cerium-tungsten alloy billets.
本文研究了空心阴极效应的发热机理及空心阴极等离子烧结铈钨坯的工艺。
Cathode plasma moves ahead to the anode and changes diode effective gap. Plasma's expanding velocity is determined by electric field, density gradient and temperature gradient.
决定阴极等离子体膨胀速度的因素主要有二极管区的电场强度、等离子体的密度梯度和等离子体温度梯度等因素。
Plasma Nitriding Plasma can accelerate the reactions by increasing the energy of nitrogen ions and additionally activating them as a result of cathode sputtering.
血浆氮化物血浆能借由增加能源加速反响氮离子而且此外启动他们结果阴极溅散。
The emission spectra of he plasma were measured by using three types of experiment devices: dielectric barrier discharge device, hollow-cathode discharge device and Penning discharge device.
采用三种实验装置(介质阻挡放电装置、空心阴极放电装置和彭宁放电装置)分别测量了不同压强范围内氦等离子体的发射光谱。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
It was found that the uniformity of the extracted electron beam is satisfactory in spite of individual plasma jets on the cathode surface.
结果发现，所提取的电子束均匀性等离子体射流在个别尽管令人满意的阴极表面。
The ion (n + 2) transport process in cathode dark space of nitrogen glow discharge plasma is studied by using Monte Carlo Simulatoon.
采用蒙特卡罗方法对氮气辉光放电等离子体阴极区离子(N +2)的运输过程进行了模拟。
The cathode -governed VAD plasma is not in a local thermal equilibrium condition, and the ion demonstrates high directed velocity in excess of its thermal value.
由阴极过程主导的VAD等离子体并不满足局部热力学平衡条件，其中的离子表现出非常强的流动性。
According to operating mode of the cathode in the thruster, the design of the cathode structure, including selection of the materials and the technology of the plasma spray, were described.
根据阴极在推进器中工作方式，对阴极结构设计进行了描述，包括材料选择和等离子体喷涂工艺制造。
The plasma produced in ablative capillaries by high power discharges between an anode and a hollow cathode can be used as sources for electrothermal/electrothermal chemical launchers.
利用可消融材料制成毛细管，在其两端阳极与中空阴极间进行大功率放电，形成高压等离子体源。
The prepulse will result in forming plasma, and further affect the diode performance. To remove or reduce this effect, a crowbar tube with cold cathode was adopted in the accelerator.
为了减少预脉冲电压引起的等离子体发射对正常状态的影响，采用了一种冷阴极撬棒管，将它与阴极杆相连。
An optical fiber transmission module is utilized to separate the plasma generator's cathode potential fluctuation from the measurement system and the measurement system works well.
文中采用光导纤维传输模块隔离阴极电位，消除了阴极电位浮动对测量通道安全的威胁，使测量系统安全工作。
The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.
真空室内的气体等离子体可由热灯丝或射频放电产生，4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
毫克每显示的直流等离子显示器中阴极溅射抑制剂中的汞含量。
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
毫克每显示的直流等离子显示器中阴极溅射抑制剂中的汞含量。
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