Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
The emission spectra of he plasma were measured by using three types of experiment devices: dielectric barrier discharge device, hollow-cathode discharge device and Penning discharge device.
采用三种实验装置(介质阻挡放电装置、空心阴极放电装置和彭宁放电装置)分别测量了不同压强范围内氦等离子体的发射光谱。
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