Thermal Evaporation Deposition 热蒸镀法 ; 热蒸发蒸镀法 ; 热蒸发
Arc-evaporation deposition 电弧蒸发沉积法
chemical evaporation deposition 化学涂层
laser evaporation deposition 激光蒸发沉积
Electron Beam Evaporation Deposition System 电子束蒸发仪
Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition.
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。
The method can be used not only for vacuum evaporation deposition, but also for sputtering deposition to prepare the thin-film.
它 既能用于真空蒸发沉积，又可用于溅射沉积来制备薄膜。
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。
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