Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition.
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。
The method can be used not only for vacuum evaporation deposition, but also for sputtering deposition to prepare the thin-film.
它既能用于真空蒸发沉积，又可用于溅射沉积来制备薄膜。
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。
Connecting with the produce practice, in the process of vacuum evaporation deposition decorative film, the action of base paint on plastic surface has been introduced simply in this paper.
结合生产实际，本文简单介绍了塑料表面真空蒸镀装饰膜的生产工艺中，底涂料涂装的作用。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Power in ion deposition arc evaporating unit, type ZXG is specially used for the arc evaporation of multi-arc ion coating equipment.
ZX G型离子沉积电弧蒸发电源装置，专门用于多弧离子镀膜机的电弧蒸发。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
Silicon nano-wires (SiNWs) were fabricated on Anodized Aluminum Oxide (AAO) template and silicon chips by the Chemical vapor Deposition (CVD) and thermal evaporation method.
本课题利用化学气相沉积(CVD)和热蒸发法在硅片称底和多孔氧化铝(aao)模板上制备纳米硅线。
The invention relates to physical or chemical vapor deposition, such as evaporation, of metal current collector on electrode with self-supporting type.
本发明涉及自支撑式电极上金属集电器的物理或化学汽相沉积，例如蒸发。
The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。
The occurrence of impurities during the deposition process can also be caused by the evaporation of certain substrate materials.
沉积过程中杂质也可因某些基体材料的蒸发而产生。
LaF3 single-layer coatings were prepared by thermal boat evaporation at different deposition rates. Some of these films were annealed in vacuum.
用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜，并对部分单层膜进行了真空退火。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
纳米碳管自1991年被发现以来，目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
纳米碳管自1991年被发现以来，目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
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