它包括射频磁控溅射、反应溅射、多元靶溅射及离子束溅射等,通常使 用直流溅射、射频磁控溅射(RF magnetron sputtering)和离子束溅射来制备PZT 薄膜。
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MnO,薄膜的制备方法上主 要采用射频磁控溅射(RFMS)、脉冲激光沉积(PLD)、分子束外延(MBE)、溶胶一 凝胶法(Sol—Gel),也有报道采用化学溶液沉积法(CSD),如印度理工研究所...
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目前常用的制备 PZT 铁电薄膜的方法有溶胶凝胶法 (Sol-gel) 、射频磁控溅射(RF Sputtering)、金属有机物化学气相淀积(MOCVD) 、脉冲激光 沉积(PLD) 、分子束外延(MBE) 等。
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直流脉冲磁控溅射制备MO薄膜及其性能研究(精品论文) - docin.com豆丁网 要有直流磁控溅射(Direct Current MagnetronSputtering,DCMS)、射频磁控溅射(RadioFrequencyMagnetronSputtering, RFMS)和直流脉冲磁控溅射(Direct CurrentPulse MagnetronSputtering,
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射频磁控溅射法 RF magnetron sputtering ; radio frequency magnetron sputtering method ; RFMS
反应射频磁控溅射系统 Reactive Sputtering System
用射频磁控溅射 Radio frequency-magnetro sputtering ; RF-MS
利用射频磁控溅射 Radio frequency-magnetro sputtering ; RF-MS
用射频磁控溅射法 Radio-frequency magnetron sputtering ; RFMS
射频磁控反应溅射 radio frequency magnetron reactive sputtering
射频反应磁控溅射技术 RF reactive magnetron sputtering
The preparation of crystalline Ce:YIG on amorphous silica substrate by RF magnetron sputtering method is discussed in this thesis.
在二氧化硅基片上用射频磁控溅射法制备Ce:YIG薄膜,也是论文的一部分工作。
参考来源 - 基于磁光薄膜波导的集成光隔离器的研究The Mg_(0.1)Zn_(0.9)O:Al films prepared by radio frequency magnetron sputtering on glass substrates were polycrystalline with hexagonal wurtzite structure and had a preferred orientation (002) with the c-axis perpendicular to the substrates. The diffraction angle 2θ was about 34.6°.
采用射频磁控溅射法在玻璃衬底上制备出的Mg_(0.1)Zn_(0.9)O∶Al薄膜为多晶膜,具有六角纤锌矿结构和(002)方向的择优取向,衍射角2θ位于34.6°附近。
参考来源 - MgZnO:Al透明导电膜的制备与特性研究The Fe80Pt20 films with thickness of 100 nm have been deposited on glass substrate by RF magnetron sputtering.
用射频磁控溅射方法在玻璃基片上制备厚度为100 nm的Fe80Pt20薄膜,研究了退火对其结构和磁性的影响。
参考来源 - 退火对Fe·2,447,543篇论文数据,部分数据来源于NoteExpress
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
本文利用射频磁控溅射方法,在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜,并将其应用于HIT太阳电池。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
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