更精细的刻蚀技术可以孕育更高性能的微芯片，而这仅仅是开始。
Finer etching begets higher-performing microchips, and that's just a start.
不能采用更短波长的激光进行芯片刻蚀已经限制了（芯片制造商）在硅晶上设计更精细的电路。
The inability to etch chips with lasers in the shorter wavelengths has limited how precisely they can design circuits on silicon.
在苏加塔湖溢流向图尔卡纳湖的长期过程中，波浪作用在这些曾经的湖岸线上刻蚀出槽口和台阶形痕迹。
During a protracted period when Lake Suguta was overflowing into Lake Turkana, wave action carved notches and terraces into these fossil shorelines.
通过纳米制备技术研究者在氮化硅中刻蚀出许多空洞以构成所需图案，使得波导具有合适的隐形折射率。
Using nanofabrication techniques, the researchers etched tiny holes into the nitride to make a desired pattern, giving the waveguide the cloaking refractive index profile.
惠普实验室的研究人员最近成功的在一块平坦的硅片上刻蚀图案，使它能像汤勺一样可以聚焦光线，惠普实验室的雷蒙德·博索尔(RaymondBeausoleil)说。
Researchers at HP Labs recently managed to etch a pattern into a flat piece of silicon so that it could focus light "like a spoon", says Raymond Beausoleil of HP Labs.
衬底预处理采用化学刻蚀和高温处理。
Chemical etching and high temperature heating were used for pretreatment of substrates.
分析了检测结果和刻蚀机理。
制作采用的是传统的光刻、刻蚀工艺。
The sensor is fabricated by traditional lithography and etching.
田纳西河刻蚀着坎伯兰高原的东部边缘。
The Tennessee River sculpts the east side of the Cumberland Plateau.
简单介绍了ICP刻蚀系统和刻蚀原理。
随着气体流量的增加，刻蚀速度不断降低。
With the increase of flow of the gas, the etching rate decreases continually.
通过调整工艺条件，可严格控制刻蚀速率。
The etching rate can be strictly controlled by adjusting technological conditions.
刻蚀工艺的分辨率是图形转移保真度的量度。
The resolution of an etching process is a measure of the fidelity of pattern transfer .
刻蚀工艺的分辨率是图形转移保真度的量度。
The resolution of an etching process is a measure of the fidelity of pattern transfer.
介绍了一种新的亚微米发射极窗口刻蚀工艺。
This paper introduces a novel submicron etching technology for emitter window.
本文介绍微波等离子体刻蚀应用的实验结果。
In this paper, the result of etching application with microwave plasma will be introduced.
在湿法刻蚀诱导坑时，需适当延长刻蚀时间。
提出了一种基于软刻蚀技术的复制和集成新工艺。
A new replication and integration techniques based on soft lithographical method are presented.
该装置具有结构简单，低损伤和各向异性刻蚀的优点。
It has advantages of sample structure, low damage and anisotropic etching.
通常，所有暴露在刻蚀剂中的材料都具有一定的刻蚀速率。
More often, all of the materials exposed to the etchant have a finite etch rate.
金属极板还被深度刻蚀，从而极大地扩展了其表面的面积。
The metal plate is also deeply etched so as greatly to increase its surface area.
等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。
High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.
结果表明，刻蚀速率与刻蚀气体的混合比率呈现非单调特性。
Results indicate that etching rates of BST thin films present non-monotonic dependence on mixing ratio of etching gases.
难熔金属和贵金属组合的这一层薄膜使刻蚀成为一个艰巨任务。
The combination of refractory and noble metals in a single layer makes etching a formidable task.
对硅的干法刻蚀技术是现代半导体工业中非常重要的一项工艺。
Dry etching technique of silicon is a very important process in the modern semiconductor industry.
本文以金属刻蚀去胶腔为背景，简述干刻清洗工艺开发和评价过程。
Based on ash chamber of metal etch this paper describes the full process of dry clean development and evaluation.
利用牺牲氧化改善刻蚀后的表面形貌，进一步减小表面的刻蚀损伤。
In this study sacrificial oxidation is used as a post-etch treatment to reduce surface roughness and etch damage.
由光致刻蚀剂记录两束相干光干涉条纹是制作全息光栅的关键步骤。
Recording the interference fringe produced from two coherent light beams by use of photoresist is a key process in manufacturing a holographic grating.
研究还发现，不同垫层（塑料片、钢片和铝板）导热性能对刻蚀速率影响很小。
Meanwhile, the difference in thermal conductivity of underlining materials (plastic sheet, steel sheet and aluminium plate) has little effect on the etching rate.
通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
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