球面像差能破坏光刻的成像质量。
Spherical aberration can damage image quality in photolithography.
与项目研发组、光刻组密切合作。
多晶硅经光刻后便形成力敏电阻条。
Photoetching polysilicon forms force sensitive resistance bar.
本文介绍了同步辐射光刻镜扫描控制系统。
In this paper a scanning mirror control system is introduced.
本文着重介绍了ITO玻璃的表面处理和光刻过程。
We mainly discuss the treatment of surface of ITO glass and process of lithography.
但是这种光刻胶会被剥离，仅留下金属结合。
But this photoresist was then peeled off, leaving only a pure metal on metal bond.
因而，该技术也是目前国际上先进光刻领域研究的热点。
Therefore, the technology of EUVL is becoming a hot point in international lithography field.
因而，该技术也是目前国际上先进光刻领域研究的热点。
Therefore, the technology of EUVL is becoming a hot point in international lithography field.
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