Energy provision is usually estimated from estimates of substrate-level phosphorylation and glycolytic flux.
通常根据底物水平的磷酸化和糖酵解通量的估计来估计能量供应。
The rate of substrate change is dependent of substrate concentration.
被酶作用物变化速率取决于被酶作用物的浓度。
The concentration of substrate was nearly linear with the reaction time.
底物浓度与反应时间存在近似的线性关系。
The effects of substrate material and surface roughness on it are studied.
研究了衬底材质及表面粗糙度对薄膜结构的影响。
There is an effect of island decoration near the step of substrate surface.
它们在基底膜表面台阶处有小岛的装饰效应。
The dissolution of substrate is the key step in steroid microbial conversion.
甾体的溶解是微生物转化反应的控制步骤。
With the seawater salinity increasing, the degradation rate constant of substrate drops.
随着污水中海水比例的增大，基质降解速率常数逐渐变小。
The effect of substrate materials and its temperature on film micro structure is studied.
研究了衬底材料、基片温度对膜微结构的影响。
We optimized the concentrations of substrate, NADPH and enzyme, temperature as well as time.
对反应底物、NADPH、酶浓度以及反应最佳温度和时间进行了优化。
Finally, we discussed it's mechanism of and two new methods of substrate surface pre-handle.
最后讨论了基片表面预处理对金刚石成核作用的机理和两种新的表面预处理方法。
The progress of pretreatment techniques of substrate surface for CVD diamond film was reviewed.
评述了化学气相沉积金刚石薄膜衬底表面预处理技术的进展情况。
With the aid of in situ monitoring tool, we have investigated the effects of substrate nitridation.
以在位监测为辅助工具，研究了蓝宝石衬底氮化的影响。
The effect of substrate and concentration from Portunus trituberculatus on digestive enzyme activity.
不同底物及浓度对三疣梭子蟹消化酶活力的影响。
It showed that the nature of substrate and the thickness of the film were important to the emissivity.
结果表明，基板选择和薄膜厚度是影响发射率的重要因素。
Mechanical microvascular obstruction may, at least in part, account for such limiting of substrate delivery.
微血管的机械性阻塞，至少可以部分说明酶解物输送的受限原因。
It's discussed that constant temperatures of substrate are very important to the deposition of the diamond film.
文中所论述的恒定的基板温度对沉积金刚石薄膜是非常重要的。
In the third chapter, results and discussions of substrate transfer of thick silicon nitride film were elaborated.
第三章为多孔硅表面氮化硅的淀积与转移技术的结果与讨论。
Bonding force of substrate and adhesive layer is large. No adhesive failure occurs during storage and construction.
基材与胶层结合力大，在存放或施工过程中不存在脱胶现象。
Structural, optical and electrical properties of the film dependence of substrate temperature are investigated in detail.
对制备薄膜的结构和光电性质及衬底温度的影响进行了详细的研究。
The physical-chemical characteristic of substrate and the effects of different substrate on growth of tomato were studied.
通过对育苗基质理化特性及基质对番茄幼苗生长的影响的研究。
And, with the enhancement of substrate bias voltage, electron energy increase gradually, electron density decrease sharply.
且随着基片偏压值的增大，电子能量有缓慢的增加，而电子密度则显著下降。
Investigated were the effects of substrate temperature on the structures and surface morphology, dielectric properties of films.
研究了衬底温度对薄膜结构、表面形貌以及介电性能的影响。
The bonding strength is ensured by the correct choice of substrate material, surface preparation, adhesive and process parameter.
粘合强度可以通过选择正确的基体材料、表面处理、胶粘剂和工艺参数得以保证。
The capacities of a given mass of a specific powder to coat in a cured state an area of substrate at a determined film thickness.
在一定的厚度下，一定量的粉末在基材上涂装的面积的能力。
Under the given conditions, we can get films of columnar crystals of growth of single direction by controlled heating of substrate.
试验结果表明，在一定的工艺条件下，通过对基片的加热控制可以获得单一方向生长的柱状晶结构薄膜。
The studies of the enzymatic hydrolysis process showed that the hydrolysis efficiency was affected by the dosage of substrate and enzyme.
对酶解工艺条件的研究表明：不同底物浓度和酶用量均对酶解效率有一定的影响。
In the activation treatment on the surface of substrate, the plating metal ions was catalyzed reduction metal coating process of formation.
在经活化处理的基体表面上，镀液中金属离子被催化还原形成金属镀层的过程。
Because the hardness of substrate was low after vacuum melting, the hardness of substrate was increased by hardening and tempering methods.
由于真空烧结涂层基体的硬度较低，采用对基体调质处理的方法来提高涂层基体的硬度。
Method of semiconductor wafer back processing, method of substrate back processing, and radiation-curable pressure-sensitive adhesive sheet.
半导体晶圆背面加工方法，衬底背面加工方法，和辐射固化型压敏粘着片。
It has the advantage of accuracy, rapidity, non touching and is suitable for measuring the temperature of substrate in vacuum coating plants.
它具有测量准确、反应速度快、非接触等特点，尤其适用于测量真空镀膜中基板的温度。
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