Energy provision is usually estimated from estimates of substrate-level phosphorylation and glycolytic flux.
通常根据底物水平的磷酸化和糖酵解通量的估计来估计能量供应。
It has the advantage of accuracy, rapidity, non touching and is suitable for measuring the temperature of substrate in vacuum coating plants.
它具有测量准确、反应速度快、非接触等特点，尤其适用于测量真空镀膜中基板的温度。
The dissolution of substrate is the key step in steroid microbial conversion.
甾体的溶解是微生物转化反应的控制步骤。
The film component phase is dependent primarily on the negative bias of substrate.
膜的相组成主要是基板负偏压所决定的。
This study is significant to surface treatment of substrate in electroless deposition.
该研究对于化学镀基底材料的表面处理具有重要意义。
We optimized the concentrations of substrate, NADPH and enzyme, temperature as well as time.
对反应底物、NADPH、酶浓度以及反应最佳温度和时间进行了优化。
The progress of pretreatment techniques of substrate surface for CVD diamond film was reviewed.
评述了化学气相沉积金刚石薄膜衬底表面预处理技术的进展情况。
The influence of substrate distortion on the energy of intermediate formation has been considered.
考虑了底物变形对中间体形成能量的影响。
With the aid of in situ monitoring tool, we have investigated the effects of substrate nitridation.
以在位监测为辅助工具，研究了蓝宝石衬底氮化的影响。
The effect of substrate and concentration from Portunus trituberculatus on digestive enzyme activity.
不同底物及浓度对三疣梭子蟹消化酶活力的影响。
It showed that the nature of substrate and the thickness of the film were important to the emissivity.
结果表明，基板选择和薄膜厚度是影响发射率的重要因素。
The influence of substrate pretreatment methods on the nucleation density of diamond films was studied.
研究了衬底预处理方法对金刚石薄膜成核的影响。
Bonding force of substrate and adhesive layer is large. No adhesive failure occurs during storage and construction.
基材与胶层结合力大，在存放或施工过程中不存在脱胶现象。
Investigated were the effects of substrate temperature on the structures and surface morphology, dielectric properties of films.
研究了衬底温度对薄膜结构、表面形貌以及介电性能的影响。
The bonding strength is ensured by the correct choice of substrate material, surface preparation, adhesive and process parameter.
粘合强度可以通过选择正确的基体材料、表面处理、胶粘剂和工艺参数得以保证。
The influences of substrate temperature on the microstructures, optical, and electrical properties of ZGO films have been studied.
研究了基体温度对ZGO薄膜的晶体结构、电学和光学性能的影响。
Under the given conditions, we can get films of columnar crystals of growth of single direction by controlled heating of substrate.
试验结果表明，在一定的工艺条件下，通过对基片的加热控制可以获得单一方向生长的柱状晶结构薄膜。
In this study, system analysis of substrate spectra of predicted sugar transporters in N. crassa was performed at genome-wide level.
本研究从全基因组水平系统分析了粗糙脉孢菌预测糖转运蛋白的转运底物。
The effect of substrate surface pre-polishing on nucleation of diamond and structure of diamond thin films by HFCVD has been studied.
本文研究了在热丝CVD方法生长金刚石薄膜中，基片表面的研磨处理对金刚石成核密度以及生长膜结构的影响。
A new conception, average powder density defined as the powder quantity clad on unit area of substrate surface has been put for ward.
提出了粉末分布密度这一新概念，即同步送粉激光熔覆时基体单位面积上分布的覆层粉末质量。
The results show that the effectiveness of crosstalk reduction depends on the dielectric losses of substrate and parameters of via holes.
模拟结果表明串扰衰减程度与基底介质的损耗、接地孔参数有关。
The studies of the enzymatic hydrolysis process showed that the hydrolysis efficiency was affected by the dosage of substrate and enzyme.
对酶解工艺条件的研究表明：不同底物浓度和酶用量均对酶解效率有一定的影响。
The experimental results indicate that pretreatment is a key factor that strongly affected the hydrogen production potential of substrate.
研究结果表明，预处理是影响底物产氢潜势的关键因素之一。
Method of semiconductor wafer back processing, method of substrate back processing, and radiation-curable pressure-sensitive adhesive sheet.
半导体晶圆背面加工方法，衬底背面加工方法，和辐射固化型压敏粘着片。
The growth rate model and dynamics model of substrate consuming were established after studied the growth characteristics for Grifola frondosa.
研究了灰树花的生长特性，建立了灰树花的生长速率模型和基质消耗动力学模型；
Based on analysis of the principle of substrate current of MOSFETs, a new hot carriers resistant structure of CMOS digital circuits is proposed.
本文在分析MOSFET衬底电流原理的基础上，提出了一种新型抗热载流子退化效应的CMOS数字电路结构。
According to the computed results, the relationship between bandgap and lattice structure, fill ratio, refractive index of substrate is studied.
根据统计的模拟结果，分析了光子晶体带隙与晶格结构、填充比和本底折射率的关系。
The parameters of coated surfaces in this article are the hardness of coatings and substrate, the thickness of coatings, the roughness of substrate.
涂层参数是指涂层及基体的硬度值、涂层厚度和基体表面粗糙度。
The parameters of coated surfaces in this article are the hardness of coatings and substrate, the thickness of coatings, the roughness of substrate.
涂层参数是指涂层及基体的硬度值、涂层厚度和基体表面粗糙度。
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