本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
用激光溅射-分子束技术,研究了几种过渡金属离子与乙腈团簇分子的气相化学反应。
Reactions of transition metals with acetonitrile clusters in the gas phase are studied using laser ablation-molecule beam technique.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
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