本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
用激光溅射-分子束技术，研究了几种过渡金属离子与乙腈团簇分子的气相化学反应。
Reactions of transition metals with acetonitrile clusters in the gas phase are studied using laser ablation-molecule beam technique.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
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