采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用扫描透射电镜（STEM） ，研究了铝上磁控溅射沉积铀薄膜的形貌、组织、结构以及铀薄膜的生长模型。
Model of growth, surface morphology, microstructure and of the Uraniun films by magnetron sputter deposition have been investigated by scanning transmission electron microscopy(STEM).
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
应用推荐