...得注意的是，有别于传统半导体制程采用光罩制程来刻划晶圆所需的结构图像，伊利诺大学的实验室采用了「软光刻(soft lithography)制程，制造出用以覆盖在砷化镓晶圆表面的金属薄膜。
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This paper will emphasize on the application of soft lithography in the fabrication of μ-TAS.
本论文讨论的重点便是将软光刻技术引入到微全分析系统的加工之中。
参考来源 - 微全分析系统中微传递成模软光刻技术研究·2,447,543篇论文数据，部分数据来源于NoteExpress
介绍了一种用软光刻技术制作微流芯片上PDMS微混合器的工艺。
A process of soft lithography was introduced for fabrication of PDMS (polydimethylsiloxane) micro-mixer on micro-fluidic chip.
以紫外光光刻、硅蚀刻及软光刻技术制备了微柱阵列型细胞培养基底。
UV lithography, silicon etching and soft lithography were adopted to fabricate micropillar arrayed cell culture substrates.
为了解决软光刻技术中核心元件弹性印章的制备技术，对SU-8胶印模和聚合物弹性印章进行了工艺研究。
Processes of SU-8 photoresist mold and polymer elastomeric stamp were researched in order to solve the technology of the key part—elastomeric stamp in the soft-lithography.
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