Conductivity of the intrinsic thin silicon films that deposited in chamber to deposit boron doped films is found to be too high.
6．在硼掺杂室沉积的本征硅薄膜显示出过高的电导率。
参考来源 - 微晶硅薄膜的高速沉积研究·2,447,543篇论文数据，部分数据来源于NoteExpress
在本文中主要开展了硼掺杂金刚石薄膜的电化学性能及在污水处理中的应用研究。
The electrochemical properties of boron-doped diamond (BDD) thin film electrodes films and their applications to wastewater treatment have been investigated.
以硼掺杂金刚石薄膜（BDD）为电极，采用电化学氧化的方法对含氯酚废水进行实验研究。
The electrochemical oxidation of wastewater containing chlorophenols was investigated experimentally using synthetic boron-doped diamond(BDD) thin film electrodes.
本文采用微波等离子体cvd法制备定向生长的金刚石薄膜。用冷离子注入法对金刚石薄膜进行硼掺杂。
The diamond films were fabricated by microwave plasma CVD and the boron-doped was created by the cold ion implantation.
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