本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
分析湿法磷酸过滤设备与管道结垢的主要原因是氟硅酸钾、钠盐因磷酸液相温度下降而沉积下来。
The scaling on equipment and pipeline of WPA filtration unit is caused by the precipitation of potassium and sodium fluosilicate when the temperature of acid decreases.
MOCVD是金属有机物化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD is an abbreviation form for Metal Organic Chemical Vapor Deposition, which is a method used to grow material crystal on substrate via MOCVD device.
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