本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
分析湿法磷酸过滤设备与管道结垢的主要原因是氟硅酸钾、钠盐因磷酸液相温度下降而沉积下来。
The scaling on equipment and pipeline of WPA filtration unit is caused by the precipitation of potassium and sodium fluosilicate when the temperature of acid decreases.
MOCVD是金属有机物化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD is an abbreviation form for Metal Organic Chemical Vapor Deposition, which is a method used to grow material crystal on substrate via MOCVD device.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
MOCVD是金属有机化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.
采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备，在单晶硅衬底上沉积了金刚石薄膜。
Diamond thin films were successfully deposited on single - crystal si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD).
介绍了独联体国家难熔金属氟化物化学气相沉积的工艺、设备及其产品的开发情况和研究进展。
This paper reviews fluorides CVD methods for refractory metals in CIS countries, including modern development of the equipment and products.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
介绍了真空气相沉积法制备聚对二甲苯薄膜的实验设备、实验原理和实验方法。
The paper focuses on vacuum vapor deposition for making parylene film which is used in many targets. The experiment facility and principle are described too.
本发明的化学气相沉积室的清洁方法，可以代替湿法清洁方法实现对沉积室的全面清洁，操作方便、快捷，并可减少设备的闲置时间，提高生产效率。
The method can substitute a wet cleaning method to clean completely the deposition chamber, is easy and rapid to operate, can reduce the idle time of equipment and improve the productivity.
北京一半导体公司急聘一名化学气相沉积(CVD)设备工程师，待遇从优。
A semiconductor company based in Beijing is in need of a Chemical Vapor Deposition (CVD) equipment Engineer with very competitive salary and other benefits.
北京一半导体公司急聘一名化学气相沉积(CVD)设备工程师，待遇从优。
A semiconductor company based in Beijing is in need of a Chemical Vapor Deposition (CVD) equipment Engineer with very competitive salary and other benefits.
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