本研究采用常压化学气相沉积（CVD）的方法在金属铝基底上制备出硅氧化合物陶瓷膜层。
A new kind of silicon oxidic film on aluminum was prepared by chemical vapor deposition (CVD) in ambient pressure.
和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。
The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
采用常压CVD方法在铝合金基底上制备出硅氧化合物陶瓷膜层。
The silicon oxide films on aluminum alloys matrix were prepared by chemical vapor deposition (CVD) in ambient pressure.
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