The methods for improving interference pattern contrast and period stability are also studied. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask-hologram mask-resist have been deeply investigated.
对全息光刻的原理、理论、实现方法及传统光掩模—全息掩模—抗蚀剂图形传递机理进行了深入的研究，设计和建立了采用直角棱镜和折射率匹配液的全内反射波前共轭全息光刻实验系统，进行了实验研究。
参考来源 - 激光干涉光刻技术·2,447,543篇论文数据，部分数据来源于NoteExpress
原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
对于要求同时检测矩形或接近矩形槽形的全息光刻胶光栅掩模的槽深和占宽比，该方法完全适用。
The method is qualified for measurement of groove depth and duty cycle simultaneously for the rectangle-shaped or similar profile of holographic grating mask.
采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
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