原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
对于要求同时检测矩形或接近矩形槽形的全息光刻胶光栅掩模的槽深和占宽比，该方法完全适用。
The method is qualified for measurement of groove depth and duty cycle simultaneously for the rectangle-shaped or similar profile of holographic grating mask.
采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
用光刻胶记录了水窗波段同轴X射线全息图，并以数字方法再现了原物像。
Soft X-ray holograms within water-windows are recorded in photoresist and reconstructed by using numerical technology.
用光刻胶记录了水窗波段同轴X射线全息图，并以数字方法再现了原物像。
Soft X-ray holograms within water-windows are recorded in photoresist and reconstructed by using numerical technology.
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