用光致抗蚀胶制作图形的一种方法，如彩色滤光膜制作时颜料分散法和染色法采用的光刻法。它是将颜料或染料分散在感光胶中，通过掩膜曝光，被曝光部分感光胶聚合，变成非水溶性胶膜在显影时留下，其余部分被冲洗掉，如此重复3次，形成三色彩色滤光膜。
... photolithgraphic 光刻法的 photolithography 光蚀刻微影; 光刻法; 平印照相制板 photolocking 光锁定 ...
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The traditional technologies such as photolithography and soft lithography were hardly accepted by ordinary laboratories because of the limitation of the harsh conditions, time-consuming, high cost and irregular channel shape of the cross-section.
传统的PDMS微通道的制作技术如光刻法、软刻法,由于技术条件苛刻、费时、成本较高以及形成的通道截面形状不规则等限制,难于被普通实验室所接受。
参考来源 - PDMS微通道内微流动行为的Micro·2,447,543篇论文数据，部分数据来源于NoteExpress
例子：“在180 nm下，光刻法就会出现问题”，换句话说，“这就好像用一大块粉笔来画蓝图一般”。
"Or, in other words," it's like trying to draw a blueprint with a hunk of chalk.
采用光刻法和剥离法进行了阵列电极的制作，并成功键合了带有阵列电极的PD MS -玻璃混合微流控芯片。
The array electrodes were produced by method of photolithography and stripping. and a PDMS-glass microfluidic chip integrating the array of electrodes was bonded efficiently.
并对两种制备方法做了比较，在分析了制作的凸点的质量后，认为经过改进的蒸发结合光刻法可以制作高质量的阵列凸点。
The analysis of the quality of the bumps fabricated by using these two methods shows that the improved evaporation plus lithography method can be used to fabricate bumps with high quality.
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