该 树脂组合物是可以用于光纳米印制的低粘度而干蚀刻性优异的光固化 性树脂。
This low-viscosity photocurable resin composition has excellent dry etching resistance and is applicable to optical nanoprinting.
本发明提供一外延沉积工艺，其包含干式蚀刻工艺与后续的外延沉积工艺。
An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.
去膜：蚀刻后将抗蚀层干膜去除，得到所需的裸铜电路图图。
Strip Resist: The hardened dry film is stripped from the copper leaving the desired copper pattern reproduced from the artwork.
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