The source material for a sputtering process.

溅射工艺用源材料。

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Its approach is to deposit the CIGS layer using a sputtering process borrowed from the disk-storage industry.

它的方法是通过借鉴于碟片储存行业的“喷溅”处理来沉积CIGS层面。

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The results show that the sputtering process factors have large effect on the compositions and magnetic properties.

结果表明，溅射工艺因素对薄膜的成份和磁性能有较大的影响。

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These include "sputtering" erosion - the bombardment of the surface by very fast charged particles (a process similar to sandblasting) - and impacts by meteorites.

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