The results show that the sputtering process factors have large effect on the compositions and magnetic properties.
结果表明，溅射工艺因素对薄膜的成份和磁性能有较大的影响。
We employ the magnetic sputtering method to deposit amorphous tungsten films and investigate their thermal annealing process.
对使用磁控溅射法沉积的钨薄膜进行了热退火研究。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.
利用有限元理论对靶表面磁通量密度的横向分量进行了模拟分析。
应用推荐