cathode sputtering 阴极溅射法
rectangle double-plane magnetron sputtering cathode 矩形双平面磁控溅射阴极
cathode sputtering atomizer 阴极溅射原子化器
sputtering hollow cathode discharge 溅射型空心阴极放电
cathode sputtering equipment 阴极溅射设备
cathode sputtering chamber 阴极溅射室
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
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