在氧气氛围中等离子体［4sl，活性离子束（reactive ion beam， RIBE）¨“，活性离子（reactive ion，RI）¨引刻蚀Parylene表面已有众多报道。
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reactive ion beam etch 活性离子束腐蚀
reactive ion beam oxidation 活性离子束氧化
reactive ion-beam sputtering 反应离子束溅射
reactive ion beam plating 反应离子束镀
reactive ion beam etching 反应离子束蚀刻
reactive ion-beam etching 反应离子束刻蚀
reactive ion beam sputter 反应离子束溅射
reactive ion beam etching system 反应性离子束蚀刻系统
It can be used for single ion implantation, ion beam mixing, single ion or reactive ion beam sputter-deposition and ion beam enhanced deposition.
可用于单离子注入，离子束混合，单离子或反应离子束溅射淀积以及离子束增强淀积。
The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
High quality ITO films are prepared onto K9 glass substrates by oxygen ion-assisted electron beam reactive evaporation.
采用氧离子辅助电子束反应蒸发工艺在K9玻璃基底上制备了性能优异的ITO薄膜。
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