反应离子束刻蚀
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reactive ion beam etching 反应离子束蚀刻
reactive ion beam etching system 反应性离子束蚀刻系统
reactive ion beam etching techniques 反应离子束蚀刻
Ion Beam Assisted Reactive Etching 离子束辅助反应刻蚀
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The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
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