物理气相沉积是多种溅射 技术的通称, 它包括射频溅射 ( radio frequency sputtering) 、直流反应磁控溅射 ( reactively direct current magnetron sputtering , RDCMS) 和粒子束增强沉 积(ion2beam2assisted deposi...
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•溅射法依不同能源，可分射频溅射法(radio frequency sputtering)及 直流磁控溅射法 ( DC magnetron sputtering )。 •利用射频溅射技术可获得稀土金属氟化合物(REMF)-MoS 2 -Au 多 层奈米薄膜。
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Radio-Frequency Sputtering System 射频磁控溅镀系统
radio frequency sputtering deposition 射频溅射沉积
Radio-frequency magnetron sputtering 用射频磁控溅射法
radio frequency magnetron sputtering method 射频磁控溅射法
reactive radio frequency magnetron sputtering 反应射频磁控溅射
radio frequency magnetron co-sputtering 射频磁控复合溅射
The results of XRD showed that the D. C. reactive sputtering ZrN films were mainly amorphous and the radio frequency sputtering ZrN films were mainly crystalline.
X射线衍射分析表明,直流溅射法制备的氮化锆薄膜一般为非晶,而射频溅射法制备的氮化锆薄膜为晶态。
参考来源 - 口腔材料表面氮化锆薄膜制备工艺与性能·2,447,543篇论文数据，部分数据来源于NoteExpress
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