In an exemplary embodiment, a plasma processing chamber is provided.
在一个示范性实施例中，提供一种等离子处理室。
A method of fault detection for use in a plasma processing chamber is provided.
提供一种用于等离子处理室的失效检测方法。
The plasma processing chamber includes a substrate support configured to receive a substrate.
该等离子处理室包括一个配置为容纳 基片的基片支撑件。
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