Broadly speaking, the embodiments of the present invention provide an improved plasma processing mechanism, apparatus, and method to increase the process uniformity at the very edge of the substrate.
大体而言,本发明的实施例提供了改进的等离子处理机构、设备和方法以提高基片边缘处的处理均匀性。
That process increases uniformity, eventually to the level the universe began with.
这一过程增加了宇宙的均匀性,并最终使其达到宇宙诞生时的水平。
Now, in 9.5 there is uniformity in the process model of DB2 as EDUs are now thread based on Linux, UNIX, and Windows environments.
而在9.5中,DB2的进程模型得到统一,现在EDU在Linux、UNIX和Windows环境中都是线程。
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