Broadly speaking, the embodiments of the present invention provide an improved plasma processing mechanism, apparatus, and method to increase the process uniformity at the very edge of the substrate.

大体而言，本发明的实施例提供了改进的等离子处理机构、设备和方法以提高基片边缘处的处理均匀性。

youdao

That process increases uniformity, eventually to the level the universe began with.

ECONOMIST: Cosmology

That means across-the-board reductions in every facet of military spending other than overseas contingencies and personnel outlays, a chaotic process in which waste would be maximized by the uniformity with which the rate of reduction is applied.

FORBES: Defense Industry Facing Biggest Funding Cut In 60 Years Next January