In an exemplary embodiment, a plasma processing chamber is provided.
在一个示范性实施例中,提供一种等离子处理室。
Plasma processing technology is a new technology developed in semiconductor manufacturing.
等离子体加工技术是在半导体制造中创立起来的一种新技术。
The plasma processing chamber includes a substrate support configured to receive a substrate.
该等离子处理室包括一个配置为容纳 基片的基片支撑件。
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