一种新的计算光刻算法将来自检测系统的透射与反射图像转换为实际光罩图案的模型表示，包括图案缺陷(pattern defects)。这个关键的第一步要求使用高分辨率的透射与反射光图像来对高精度的光罩图案进行建模。
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flow pattern defects 显微镜对流动图形缺陷 ; 流动图形缺陷
defects pattern recognition 缺陷分析
Shanghai pattern effects and defects 上海模式的成效与缺陷
After rapid thermal annealing(RTA) in Ar atmosphera at high temperature, the flow pattern defects(FPDs) density decreased more sharply in Sb-doped wafers than that in lightly B-doped wafers.
研究了掺杂剂原子种类及快速热处理技术对大直径直拉硅单晶中空洞型微缺陷密度的影响。
It can also help find potential defects peculiar to a specific design pattern. Links to these tools can be found in resources.
此外，它还能帮助查找与特定的设计模式相关的潜在缺陷。
Advanced algorithms of image processing and pattern recognition are adopted to improve detection rate and classification rate of defects.
同时，系统采用了先进的图像处理和模式识别算法，以提高系统对缺陷的检出率和识别率。
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