微波等离子化学气相沉积 (MPCVD )是目前制备高质量大面积金刚石膜的主要方法之一。同金刚石焊接刀具相比 ,金刚石涂层WC Co刀具具有优良的抗热冲击性能、高加工
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MPCVD resonance cavity MPCVD谐振腔
This is an alternative method for the synthesis of diamond-SiC composites by MPCVD.
此研究结果为制备金刚石和碳化硅复合材料提供了一种新的方法。
Based on these results, a kinetic model for diamond nucleation in MPCVD system was proposed. The critical gas pressure corresponding to the highest nucleation density was also discussed.
在此基础上，提出一种MPCVD系统中金刚石成核的动力学模型，并指出对应于最高成核密度有一临界压强存在。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
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