This is an alternative method for the synthesis of diamond-SiC composites by MPCVD.
此研究结果为制备金刚石和碳化硅复合材料提供了一种新的方法。
The globe-like diamond microcrystalline aggregates were fabricated by microwave plasma chemical vapor deposition (MPCVD) method.
以镍为催化剂，利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
By microwave designing for substrate heating materials, the larger uniform temperature field areas than the diameter of substrate holder in MPCVD device is obtained.
通过对基片加热材料的微波设计，在MPCVD装置中获得大于基片台直径的均匀温度分布区。
Based on these results, a kinetic model for diamond nucleation in MPCVD system was proposed. The critical gas pressure corresponding to the highest nucleation density was also discussed.
在此基础上，提出一种MPCVD系统中金刚石成核的动力学模型，并指出对应于最高成核密度有一临界压强存在。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
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