high-deposition-rate sediment drift 高速堆积体 high rate deposition 快速淀积 Electron Bean High-rate Deposition 高速电子枪沉积技术上 ..
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Electron Bean High-rate Deposition 高速电子枪沉积技术上
high deposition rate 高沉积率
This effect is very significant at low substrate temperature or high deposition rate.
而且能量的影响在较低的基片温度或是较高的沉积速率时更加显著。
High ionization rate, full reaction, pure film color, fast deposition.
离化率高，膜层反应充分，使膜层颜色纯正，沉积速度快。
Thus, using this CVD configuration a relatively high deposition rate can be achieved while obtaining desired levels of coating uniformity.
因此，使用所述CVD配置可达到相对较高的沉积速率，同时获得所要程度的涂层均一性。
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