Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
In this paper, several thin films samples of vanadium oxide were got by high-frequency Magnetron sputter with pure metal vanadium as sputter source.
本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
应用推荐