Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
In this paper, several thin films samples of vanadium oxide were got by high-frequency Magnetron sputter with pure metal vanadium as sputter source.
本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
The frequency stability of the power source for a feedback LINAC depends on the slow shift, stability and form of power spectrum of the magnetron.
功率反馈电子直线加速器功率源的频率稳定性与磁控管功率谱的慢漂移、谱的稳定性和谱的形状有关。
The' main factors resulting in local frequency tracking error are analyzed based on the principles of the tracking local oscillator for frequency agile radars of rotary tuning magnetron type.
本文从旋转变频磁控管式频率捷变雷达的本振频率跟踪原理出发，分析了产生本振频率跟踪误差的主要因素。
The FM system is used for changing the oscillating frequency of the magnetron.
调频机构用来改变磁控管的振荡频率。
A stable plasma in the mirror is produced by using microwave with magnetron at electron cyclotron frequency.
利用工作于电子回旋频率的磁控管发射的微波功率在磁镜中产生了稳定的等离子体。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
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