Ion etching technology 离子刻蚀技术
wet etching technology 湿法腐蚀工艺
deep etching technology 深刻蚀技术
freeze-etching technology 冷冻蚀刻技术
Metal Etching Technology 金属蚀刻技术
plasma etching technology 等离子体刻蚀技术
anisotropic etching technology 各向异性腐蚀
electrochemical etching technology 电化学阳极腐蚀技术
This paper introduces a novel submicron etching technology for emitter window.
介绍了一种新的亚微米发射极窗口刻蚀工艺。
The method utilizes the soft etching technology to process the exposed contact area.
所述方法利用软蚀刻技术加工所述暴露的接触区。
Some binary optical elements were manufactured by parallel direct writing and inductive couple plasma etching technology.
利用并行直写技术与感应耦合等离子刻蚀技术制作了部分二元光学元件。
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