cathode vacuum arc deposition 阴极真空弧沉积
Pulsed Vacuum Arc Deposition 脉冲真空电弧沉积
cathodic vacuum arc deposition 阴极电弧离子沉积
filtered cathode vacuum arc deposition 过滤阴极真空电弧离子镀膜技术
VAD vacuum arc deposition 真空电弧沉积
pulse vacuum arc deposition 脉冲真空电弧沉积
filtered vacuum arc deposition 过滤式电弧沉积
filtered cathodic vacuum arc deposition 过滤阴极真空弧沉积
magnetically filtered vacuum arc deposition 磁过滤阴极真空弧沉积
It is possible to deposit DLC (Diamond-Like Carbon) without MP by filtered vacuum arc deposition.
采用过滤阴极电弧沉积方法有可能制成无宏观粒子的类金刚石薄膜。
Its very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD).
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
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