采用非平衡磁控溅射(Unbalance Magnetron Sputtering,UBMS)和脉冲真空电弧沉积(Pulsed Vacuum Arc Deposition,PVAD)制备类金刚石薄膜(DiamondLike Carbon,DLC),利用泰勒霍普森表面轮廓仪,研究了不...
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Its very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD).
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
Based on the introduction of pulsed film deposition and vacuum arc technique, the principles, characters, research developments and applications of laser-arc technique are presented.
本文首先介绍了脉冲激光蒸发沉积以及真空弧沉积技术，在此基础上对激光真空弧技术的原理、特点、研究现状及应用进行了文献综述。
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