vacuum annealing [机] 真空退火 ; 真空镀铝反射镜
vacuum annealing furnace 真空退火炉
vacuum annealing process 真空退火工艺
vacuum annealing temperature 真空退火温度
ultra-high vacuum annealing 超高真空退火
high vacuum annealing furnace 高真空退火炉
online vacuum annealing processing 在线真空退火工艺
semicontinuous vacuum annealing furnace 半连续真空退火炉
S16D British vacuum annealing furnace S16D型英国真空退火炉
/, TCR over -3%/K. In the study on deposition conditions, the effects of Ar/O2, sputtering power, gas pressure, vacuum annealing, substrate types and substrate temperature on the performance of vanadium oxide thin films are analyzed.
在工艺参数对氧化钒薄膜性能影响的研究中,得到了基片温度、基片类型、氩氧比例以及真空退火等条件对氧化钒薄膜性能的影响。
参考来源 - 非制冷红外探测器用高TCR氧化钒薄膜的制备研究The higher substrate temperature is, the larger residual stress is, and it is obviously larger than the vacuum annealing films.
衬底温度越高残余应力越大,而且明显高于真空退火薄膜的应力值。
参考来源 - 退火温度与衬底温度对TiNi薄膜组织结构和相变行为的影响·2,447,543篇论文数据,部分数据来源于NoteExpress
The accurate control of the work pieces temperature in vacuum annealing furnace is a typical nonlinear large time delay and cross coupling complicated problem.
而在真空退火的生产过程中,退火工件温度的精确控制是一个典型的非线性、大时滞、强耦合的复杂控制问题。
In addition, the annealing process of SiC films is mostly carried out in vacuum, argon gas or nitrogen gas ambience.
另外,对碳化硅薄膜的退火处理大多是在真空、空气、氩气或氮气气氛下进行。
The effect of vacuum annealing was also discussed.
也讨论了真空退火的影响。
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