Plasma Etching 等离子刻蚀 ; 等离子体刻蚀 ; 等离子蚀刻
dry plasma etching 等离子干法刻蚀
argon plasma etching 氩等离子刻蚀
plasma etching system 等离子体蚀刻系统
plasma etching process 等离子体刻蚀过程
radical plasma etching 自由基等离子体腐蚀
lateral plasma etching 等离子体横向刻蚀
scanning plasma etching 扫描等离子体刻蚀
Plasma etching apparatus 等离子刻蚀设备
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The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
通过深紫外光刻和感应耦合等离子刻蚀设备,制备了所设计的器件。
In this paper, the result of etching application with microwave plasma will be introduced.
本文介绍微波等离子体刻蚀应用的实验结果。
Principles of microwave ECR plasma technology are introduced briefly. Present development of it'S research and applications in system manufacturing, CVD, PVD and etching is reviewed.
本文简要介绍了微波ECR等离子体技术的原理,评述了近年来这种技术在CVD、PVD、刻蚀等方面的研究和应用的进展。
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