plasma etching pe 等离子体刻蚀
Plasma Etching 等离子刻蚀 ; 等离子体刻蚀 ; 等离子蚀刻 ; 等离子腐蚀
dry plasma etching 等离子干法刻蚀
argon plasma etching 氩等离子刻蚀
oxygen plasma etching o等离子体刻蚀
plasma etching system 等离子体蚀刻系统
plasma etching process 等离子体刻蚀过程
radical plasma etching 自由基等离子体腐蚀
lateral plasma etching 等离子体横向刻蚀
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以上来源于: WordNet
The plasma is a high energy and high activity material, it has good etching effect for any organic material, which in recent years has also been referenced to the printed circuit board manufacturing.
由于等离子体是一种具有很高能量和极高活性的物质，它对于任何有机材料等都具有良好的蚀刻作用，因而在最近几年也被引用到印制电路板制造中来。
In this paper, the result of etching application with microwave plasma will be introduced.
本文介绍微波等离子体刻蚀应用的实验结果。
High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.
等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。
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